Materials and Processes for Next Generation Lithography: Volume 11 - Rilegato

Rilegato

ISBN 10: 0081003544 ISBN 13: 9780081003541

Casa editrice: Elsevier Science Ltd, 2016

Riassunto

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches.

This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.

• Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation
• Includes information on processing and metrology techniques
• Brings together multiple approaches to litho pattern recording from academia and industry in one place

Su questo libro

Informazioni sugli autori

Dr Robinson obtained his PhD in 1999 for work on the development of materials for electron beam lithography performed at the Nanoscale Physics Research Laboratory of the University of Birmingham, and the Joint Research Center for Atom Technology in Japan. Following his PhD he investigated the modification of oxide surfaces using self-assembled monolayer, before returning to the Nanoscale Physics Research Laboratory to continue his research in lithography and microfabrication. He has recently taken up a Senior Research Fellowship in the Science City Research Alliance, based in the School of Chemical Engineering and the School of Chemistry at the Universities of Birmingham and Warwick respectively. He is currently investigating the application of advanced materials within the field of microfabrication, and the integration of functional materials with patterned substrates.

Dr Lawson received his B.S. in Chemical Engineering at Tennessee Technological University in 2005. He received a Ph.D. in Chemical & Biomolecular Engineering in 2011 at the Georgia Institute of Technology where he also completed a Postdoctoral Fellowship. Since 2015, he has been at Milliken & Company where he is a Research Engineer working in the area of chemical technologies. He is an author of over 22 publications, 41 conference proceedings, and a U.S. Patent in the area of patterning materials including photoresist and block copolymer design, synthesis, and characterization along with simulation of resist processing and BCP self-assembly.

Dalla quarta di copertina

Shelving Classification: Materials Science Title: Materials and Processes for Next Generation Lithography Imprint: William Andrew ISBN: 978-0-08-100354-1

Tagline: This book aims to bring together the world s foremost resist development scientists from the various communities to produce in one place a definitive description of the many approaches to lithography fabrication.

• This book collates up to date information from the world s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation. Includes information on processing and metrology techniques.
• The most valuable aspect will be to bring together multiple approaches to litho pattern recording from academia and industry in one place.

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches.

This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.

About the authors

Alex Robinson Senior Lecturer, School of Chemical Engineering, Edgbaston, Birmingham Senior Research Fellow of the Science City Research Alliance, University of Warwick, University of Birmingham Dr Robinson obtained his PhD in 1999 for work on the development of materials for electron beam lithography performed at the Nanoscale Physics Research Laboratory of the University of Birmingham, and the Joint Research Center for Atom Technology in Japan. Following his PhD he investigated the modification of oxide surfaces using self-assembled monolayer, before returning to the Nanoscale Physics Research Laboratory to continue his research in lithography and microfabrication. He has recently taken up a Senior Research Fellowship in the Science City Research Alliance, based in the School of Chemical Engineering and the School of Chemistry at the Universities of Birmingham and Warwick respectively. He is currently investigating the application of advanced materials within the field of microfabrication, and the integration of functional materials with patterned substrates. Richard Lawson Research Engineer, Milliken & Company, Spartanburg, South Carolina Dr Lawson received his B.S. in Chemical Engineering at Tennessee Technological University in 2005. He received a Ph.D. in Chemical & Biomolecular Engineering in 2011 at the Georgia Institute of Technology where he also completed a Postdoctoral Fellowship. Since 2015, he has been at Milliken & Company where he is a Research Engineer working in the area of chemical technologies. He is an author of over 22 publications, 41 conference proceedings, and a U.S. Patent in the area of patterning materials including photoresist and block copolymer design, synthesis, and characterization along with simulation of resist processing and BCP self-assembly.

Dettagli dell'edizione

• Editore: Elsevier Science Ltd
• Data di pubblicazione: 2016
• Lingua: Inglese
• ISBN 10: 0081003544
• ISBN 13: 9780081003541
• Rilegatura: Copertina rigida
• Numero edizione: 1
• Numero di pagine: 608
• Redattore: Robinson Alex, Lawson Richard
• Contatto del produttore: non disponibile
• Persona responsabile: LSWR Group; b.criscuolo@lswr.it; ; Via Spadolini, 7; Milano; Italia