Articoli correlati a Optical and Euv Lithography: A Modeling Perspective

Optical and Euv Lithography: A Modeling Perspective - Brossura

Erdmann, Andreas

 
9781510639010: Optical and Euv Lithography: A Modeling Perspective
Brossura
ISBN 10: 1510639012 ISBN 13: 9781510639010
Casa editrice: Spie Pr, 2021

Sinossi

Erdmann helps students science, engineering, and mathematics get started in lithographic techniques for nanofabrication. The material should also help senior engineers and managers widen their view on alternative methods and applications, he says. His focus is on the fundamental principles of image and pattern formation, rather than details of technique. His topics include image formation in project lithography, optical resolution enhancements, lithography with extreme-ultraviolet light, optical lithography beyond projection imaging, and mask and water topography effects in lithography. Annotation ©2021 Ringgold, Inc., Portland, OR (protoview.com)

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Editore
Spie Pr
Data di pubblicazione
2021
Lingua
Inglese
ISBN 10 
1510639012
ISBN 13 
9781510639010
Rilegatura
Copertina flessibile
Numero di pagine
480
Contatto del produttore
non disponibile
Persona responsabile
non disponibile