Ultra Clean Processing of Semiconductor Surfaces XII: Selected, Peer Reviewed Papers from the 12th International Symposium on Ultra Clean Processing ... 21-24, 2014, Brussels, Belgium: Volume 219 - Brossura

Brossura

ISBN 10: 303835242X ISBN 13: 9783038352426

Casa editrice: Trans Tech Pubn, 2014

Riassunto

Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium.
The 71 papers are grouped as follows:
Chapter 1: Cleaning for FEOL Applications,
Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area,
Chapter 3: Wet Etching for FEOL Applications,
Chapter 4: Wet Processing of High Aspect Ratio Structures,
Chapter 5: Fluid Dynamics, Cleaning Mechanics,
Chapter 6: Photo Resist Performance and Rework,
Chapter 7: Cleaning for BEOL Interconnect Applications,
Chapter 8: Cleaning for 3D Applications,
Chapter 9: Contamination Control and AMC,
Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells

Dettagli dell'edizione

• Editore: Trans Tech Pubn
• Data di pubblicazione: 2014
• Lingua: Inglese
• ISBN 10: 303835242X
• ISBN 13: 9783038352426
• Rilegatura: Copertina flessibile
• Numero di pagine: 332
• Redattore: Mertens Paul, Meuris Marc, Heyns Marc
• Contatto del produttore: non disponibile
• Persona responsabile: non disponibile