Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given.
Le informazioni nella sezione "Riassunto" possono far riferimento a edizioni diverse di questo titolo.
Strain is used to boost performance of MOSFETs. Modeling of strain effectson transport is an important task of modern simulation tools required fordevice design. The book covers all relevant modeling approaches used todescribe strain in silicon. The subband structure in stressed semiconductorfilms is investigated in devices using analytical k.p and numerical pseudopotentialmethods. A rigorous overview of transport modeling in straineddevices is given
Le informazioni nella sezione "Su questo libro" possono far riferimento a edizioni diverse di questo titolo.
Da: Bookbot, Prague, Repubblica Ceca
Hardcover. Condizione: Fair. Spuren von Feuchtigkeit / Nässe; Leichte Rillen / Abschürfungen / Risse / Knicke; Gebrochener Buchrücken. Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given. Codice articolo f3009956-134f-4e8d-b085-1e50b4af5b20
Quantità: 1 disponibili
Da: Romtrade Corp., STERLING HEIGHTS, MI, U.S.A.
Condizione: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide. Codice articolo ABBB-161033
Quantità: 1 disponibili
Da: Basi6 International, Irving, TX, U.S.A.
Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service. Codice articolo ABEOCT25-246664
Quantità: 1 disponibili
Da: Books Puddle, New York, NY, U.S.A.
Condizione: New. pp. 268. Codice articolo 263466322
Quantità: 1 disponibili
Da: Majestic Books, Hounslow, Regno Unito
Condizione: New. pp. 268 101 Illus. Codice articolo 4414349
Quantità: 1 disponibili
Da: Biblios, Frankfurt am main, HESSE, Germania
Condizione: New. pp. 268. Codice articolo 183466328
Quantità: 1 disponibili
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
Buch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given. 268 pp. Englisch. Codice articolo 9783709103814
Quantità: 2 disponibili
Da: moluna, Greven, Germania
Condizione: New. Codice articolo 5249518
Quantità: Più di 20 disponibili
Da: Ria Christie Collections, Uxbridge, Regno Unito
Condizione: New. In. Codice articolo ria9783709103814_new
Quantità: Più di 20 disponibili
Da: preigu, Osnabrück, Germania
Buch. Condizione: Neu. Strain-Induced Effects in Advanced MOSFETs | Viktor Sverdlov | Buch | Computational Microelectronics | xiv | Englisch | 2011 | Springer | EAN 9783709103814 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand. Codice articolo 107466437
Quantità: 5 disponibili