Da: Bookbot, Prague, Repubblica Ceca
EUR 39,38
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Aggiungi al carrelloHardcover. Condizione: Fair. Spuren von Feuchtigkeit / Nässe; Leichte Rillen / Abschürfungen / Risse / Knicke; Gebrochener Buchrücken. Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given.
Da: Romtrade Corp., STERLING HEIGHTS, MI, U.S.A.
Condizione: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
Da: Books Puddle, New York, NY, U.S.A.
Condizione: New. pp. 268.
Da: Majestic Books, Hounslow, Regno Unito
EUR 139,91
Quantità: 1 disponibili
Aggiungi al carrelloCondizione: New. pp. 268 101 Illus.
Da: Biblios, Frankfurt am main, HESSE, Germania
EUR 139,65
Quantità: 1 disponibili
Aggiungi al carrelloCondizione: New. pp. 268.
Da: moluna, Greven, Germania
EUR 136,16
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New.
Da: Ria Christie Collections, Uxbridge, Regno Unito
EUR 188,78
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New. In.
Lingua: Inglese
Editore: Springer Vienna, Springer Vienna, 2010
ISBN 10: 3709103819 ISBN 13: 9783709103814
Da: AHA-BUCH GmbH, Einbeck, Germania
EUR 160,49
Quantità: 1 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given.
Da: Revaluation Books, Exeter, Regno Unito
EUR 235,32
Quantità: 2 disponibili
Aggiungi al carrelloHardcover. Condizione: Brand New. 266 pages. 9.69x6.77x0.71 inches. In Stock.
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
EUR 160,49
Quantità: 2 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given. 268 pp. Englisch.
Lingua: Inglese
Editore: Springer Vienna, Springer Vienna Nov 2010, 2010
ISBN 10: 3709103819 ISBN 13: 9783709103814
Da: buchversandmimpf2000, Emtmannsberg, BAYE, Germania
EUR 160,49
Quantità: 1 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 268 pp. Englisch.