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Da: libreriauniversitaria.it, Occhiobello, RO, Italia
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Aggiungi al carrelloTapa blanda. Condizione: Nuevo.
Lingua: Inglese
Editore: Kluwer Academic Publishers, Norwell, Massachusetts, U.S.A., 1999
ISBN 10: 0792384873 ISBN 13: 9780792384878
Da: PsychoBabel & Skoob Books, Didcot, Regno Unito
Prima edizione
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Aggiungi al carrellohardcover. Condizione: Very Good. Condizione sovraccoperta: No Dust Jacket. First Edition. Hardcover with white lettering on spine and upper board and contents in almost new condition, showing minimal signs of wear. Previous owner's name on FEP. No dust jacket. T. Used.
Hardcover. Condizione: new. New Copy. Customer Service Guaranteed.
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EUR 333,77
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Aggiungi al carrelloBuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - A Flash memory is a Non Volatile Memory (NVM) whose 'unit cells' are fabricated in CMOS technology and programmed and erased electrically. In 1971, Frohman-Bentchkowsky developed a folating polysilicon gate tran sistor [1, 2], in which hot electrons were injected in the floating gate and removed by either Ultra-Violet (UV) internal photoemission or by Fowler Nordheim tunneling. This is the 'unit cell' of EPROM (Electrically Pro grammable Read Only Memory), which, consisting of a single transistor, can be very densely integrated. EPROM memories are electrically programmed and erased by UV exposure for 20-30 mins. In the late 1970s, there have been many efforts to develop an electrically erasable EPROM, which resulted in EEPROMs (Electrically Erasable Programmable ROMs). EEPROMs use hot electron tunneling for program and Fowler-Nordheim tunneling for erase. The EEPROM cell consists of two transistors and a tunnel oxide, thus it is two or three times the size of an EPROM. Successively, the combination of hot carrier programming and tunnel erase was rediscovered to achieve a single transistor EEPROM, called Flash EEPROM. The first cell based on this concept has been presented in 1979 [3]; the first commercial product, a 256K memory chip, has been presented by Toshiba in 1984 [4]. The market did not take off until this technology was proven to be reliable and manufacturable [5].
EUR 461,80
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Aggiungi al carrelloPaperback. Condizione: Brand New. 551 pages. 9.30x6.20x1.20 inches. In Stock.
Editore: Napoli, Morano Editore, Napoli, 1965
Da: Messinissa libri, Milano, MI, Italia
EUR 90,00
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Aggiungi al carrellobrossura. Condizione: Very Good. 1965. Copertina editoriale in pelle e sovraccoperta alettata in acetato trasparente. 711 p.; con un ritratto in bianco e nero; 26 cm. In custodia cartonata. Condizioni eccellenti.Seba. Book.
Editore: Napoli, Morano Editore, Napoli, 1966
Da: Messinissa libri, Milano, MI, Italia
EUR 90,00
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Aggiungi al carrellobrossura. Condizione: Very Good. 1966. Copertina editoriale in pelle e sovraccoperta alettata in acetato trasparente. 487 p.; con un ritratto in bianco e nero; 26 cm. In custodia cartonata. Condizioni eccellenti.Seba. Book.
Editore: Napoli, Morano Editore, Napoli, 1968
Da: Messinissa libri, Milano, MI, Italia
EUR 90,00
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Aggiungi al carrellohardcover. Condizione: Ottimo (Fine). 1968. Copertina editoriale rigida e sovraccoperta in acetato trasparente. 683 p.; 24 cmLF46.
Editore: Ente Giostra della Quintana, Foligno, 1985
Da: leonardo giulioni, ROMA, RM, Italia
EUR 40,00
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Aggiungi al carrelloCondizione: Usato buono. Testo di pp. 106 interamente illustato, copertina in cartoncino illustrato, introduione Franco Picinelli f.to cm 24x24x1, buono stato di conservazione Pagine: 106 Lingua: Italiano.
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
EUR 320,99
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Aggiungi al carrelloBuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -A Flash memory is a Non Volatile Memory (NVM) whose 'unit cells' are fabricated in CMOS technology and programmed and erased electrically. In 1971, Frohman-Bentchkowsky developed a folating polysilicon gate tran sistor [1, 2], in which hot electrons were injected in the floating gate and removed by either Ultra-Violet (UV) internal photoemission or by Fowler Nordheim tunneling. This is the 'unit cell' of EPROM (Electrically Pro grammable Read Only Memory), which, consisting of a single transistor, can be very densely integrated. EPROM memories are electrically programmed and erased by UV exposure for 20-30 mins. In the late 1970s, there have been many efforts to develop an electrically erasable EPROM, which resulted in EEPROMs (Electrically Erasable Programmable ROMs). EEPROMs use hot electron tunneling for program and Fowler-Nordheim tunneling for erase. The EEPROM cell consists of two transistors and a tunnel oxide, thus it is two or three times the size of an EPROM. Successively, the combination of hot carrier programming and tunnel erase was rediscovered to achieve a single transistor EEPROM, called Flash EEPROM. The first cell based on this concept has been presented in 1979 [3]; the first commercial product, a 256K memory chip, has been presented by Toshiba in 1984 [4]. The market did not take off until this technology was proven to be reliable and manufacturable [5]. 556 pp. Englisch.
Da: preigu, Osnabrück, Germania
EUR 277,65
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Aggiungi al carrelloBuch. Condizione: Neu. Flash Memories | Paulo Cappelletti (u. a.) | Buch | xi | Englisch | 1999 | Springer US | EAN 9780792384878 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand.
Lingua: Inglese
Editore: Springer US, Springer US Jun 1999, 1999
ISBN 10: 0792384873 ISBN 13: 9780792384878
Da: buchversandmimpf2000, Emtmannsberg, BAYE, Germania
EUR 320,99
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Aggiungi al carrelloBuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -A Flash memory is a Non Volatile Memory (NVM) whose 'unit cells' are fabricated in CMOS technology and programmed and erased electrically. In 1971, Frohman-Bentchkowsky developed a folating polysilicon gate tran sistor [1, 2], in which hot electrons were injected in the floating gate and removed by either Ultra-Violet (UV) internal photoemission or by Fowler Nordheim tunneling. This is the 'unit cell' of EPROM (Electrically Pro grammable Read Only Memory), which, consisting of a single transistor, can be very densely integrated. EPROM memories are electrically programmed and erased by UV exposure for 20-30 mins. In the late 1970s, there have been many efforts to develop an electrically erasable EPROM, which resulted in EEPROMs (Electrically Erasable Programmable ROMs). EEPROMs use hot electron tunneling for program and Fowler-Nordheim tunneling for erase. The EEPROM cell consists of two transistors and a tunnel oxide, thus it is two or three times the size of an EPROM. Successively, the combination of hot carrier programming and tunnel erase was rediscovered to achieve a single transistor EEPROM, called Flash EEPROM. The first cell based on this concept has been presented in 1979 [3]; the first commercial product, a 256K memory chip, has been presented by Toshiba in 1984 [4]. The market did not take off until this technology was proven to be reliable and manufacturable [5].Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 556 pp. Englisch.