Glawischnig h (26 risultati)

Condizione: Poor. Volume 10. This is an ex-library book and may have the usual library/used-book markings inside.This book has hardback covers. In poor condition, suitable as a reading copy. No dust jacket. Please note the Image in this listing is a stock photo and may not match the covers of the actual item,800grams, ISBN:3540118780.…

Hardcover. Condizione: Gut. Ex-library in GOOD condition with library-signature and stamp(s). Some traces of use. Ehem. Bibliotheksexemplar mit Signatur und Stempel. GUTER Zustand, ein paar Gebrauchsspuren. R-17235 3540118780 Sprache: Englisch Gewicht in Gramm: 550.

Hardcover without dust jacket. Condizione: Acceptable. Prompt Shipment, shipped in Boxes, Tracking PROVIDEDAcceptable Hardcover; 8 vo; 372 Pages; Spine head and heal bumped and nicked; Tips bumped; Foxing; Tanning pages; Stains on various pages; Signature from previous owner on the inside of front cover; Prompt shipping with tracking.…

Condizione: New.

Condizione: New.

Condizione: New. In English.

Condizione: New. In English.

Condizione: New. pp. 392.

Condizione: New. pp. 572.

Paperback. Condizione: Brand New. reprint edition. 392 pages. 9.50x6.30x0.60 inches. In Stock.

Paperback. Condizione: Brand New. reprint edition. 572 pages. 9.20x6.10x1.20 inches. In Stock.

Taschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech niques, held at Queen's University,' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan tation conference for the first time. This implantation school concentra ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.…

Taschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - The Fourth International Conference on Ion Implantation: Equipment and Tech niques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Severa1 series of conferences have dealt with the app1ication of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Bou1der, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica tions of implantation to metals and semiconductors. A schoo1 on ion implantation was held in connection with the conference, and the 1ectures presented at this schoo1 were pub1ished as Vo1. 10 of the Springer Series in E1ectrophysics under the tit1e Ion Implantation Techniques (edited by H. Rysse1 and H. G1awischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specia1ists in industry as we11 as research institutions. Espe cially effective in stimulating a free exchange of information was the daily get-together over free beer at the 'Bier Adam'. Many people contributed to the success of this conference.…

Paperback. Condizione: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

Paperback. Condizione: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

Condizione: new. Questo è un articolo print on demand.

Condizione: new. Questo è un articolo print on demand.

Taschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The Fourth International Conference on Ion Implantation: Equipment and Tech niques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Severa1 series of conferences have dealt with the app1ication of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Bou1der, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica tions of implantation to metals and semiconductors. A schoo1 on ion implantation was held in connection with the conference, and the 1ectures presented at this schoo1 were pub1ished as Vo1. 10 of the Springer Series in E1ectrophysics under the tit1e Ion Implantation Techniques (edited by H. Rysse1 and H. G1awischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specia1ists in industry as we11 as research institutions. Espe cially effective in stimulating a free exchange of information was the daily get-together over free beer at the 'Bier Adam'. Many people contributed to the success of this conference. 572 pp. Englisch.…

Taschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech niques, held at Queen's University,' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan tation conference for the first time. This implantation school concentra ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given. 392 pp. Englisch.…

Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. I Machine Aspects of Ion Implantation.- Ion Implantation System Concepts.- 1. Implanter Concepts.- 1.1 Post-Analysis.- 1.2 Pre-Analysis.- 1.3 Post-Analysis with Post-Acceleration.- 2. Criteria for the Ideal Semiconductor-Manufacturing Implanter.- 3. Low-Cur. …

Condizione: New. Print on Demand pp. 392 245 Figures, 23:B&W 6 x 9 in or 229 x 152 mm Perfect Bound on White w/Gloss Lam.

Condizione: New. Print on Demand pp. 572 474 Figures, 49:B&W 6.14 x 9.21 in or 234 x 156 mm (Royal 8vo) Perfect Bound on White w/Gloss Lam.

Condizione: New. PRINT ON DEMAND pp. 392.

Condizione: New. PRINT ON DEMAND pp. 572.

Taschenbuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -I Ion Implanters.- Physical Limitations of Ion Implantation Equipment (With 16 Figures).- A New Ion Implanter for Solar-Cell Fabrication (With 7 Figures).- SURIM - A Westinghouse Surface Implantation Machine (With 8 Figures).- A New Research Implanter at the University of Surrey (With 4 Figures).- Radio Frequency Ion Accelerator (With 6 Figures).- II Ion Sources.- Performance of the Bethge-Baumann Ion Source with Radio Frequency Operation (With 1 Figures).- Emittance Measurements on an Indirectly Heated Heavy-Ion Source (With 3 Figures).- A High-Brightness Duoplasmatron Ion Source (With 2 Figures).- Optimization of a Single-Aperture Extraction System for High-Current Ion Sources (With 9 Figures).- Development of a High-Current Ion Source for Non-Volatile Elements (With 5 Figures).- The Use of Computers for Designing and Testing Ion Beam Systems (With 23 Figures).- Multipole Ion Source for Ion Implantation and Isotope Separation (With 5 Figures).- An Ion Source for Semiconductor Implantation (With 7 Figures).- III Implanter Subsystems.- High Throughput Wafer Handling System for Serial Process Ion Implantation (With 13 Figures).- Comparison of Beam Scanning Systems (With 16 Figures).- A Low-Internal-Resistance and High-Precision High-Voltage Power Supply (With 5 Figures).- Electrostatic Switch Used for 600 kV Ion Implanter (With 6 Figures).- Automatic Wafer Handling for a Mechanically Scanned Ion Implanter (With 3 Figures).- On-Line Control of Production Ion Implanters Using Standard Desk Computers (With 3 Figures).- A Forty-Channel Optical-Fiber Telecommunication System for Manipulation of High-Voltage Terminals in Ion Implanters (With 3 Figures).- Low-Cost Analog Signal Fiber Link with 300 kV Isolation (With 3 Figures).- Improvements in the Vacuum System of a VDGAccelerator Used for Clean Ion Implantation (With 3 Figures).- IV Special Implantation Techniques.- High Temperature Implantation of Powders Using a Horizontal Ion Beam (With 2 Figures).- A Technique for Implanting Dopant Distributions in Solids (With 5 Figures).- Wafer Cooling and Photoresist Masking Problems in Ion Implantation (With 18 Figures).- Electron-Beam-Induced Recoil Implantation in Semiconductors at 300 K (With 10 Figures).- Wafer Cooling in Ion Implantation (With 8 Figures).- A Rotating Attenuator for Concentration Profiling of Implanted Helium Ions (With 6 Figures).- V Ion Beam Lithography.- Ion-Beam Lithography (With 11 Figures).- Development Characteristics of Ga+ Exposed PMMA and Associated Lithographic Resolution Limits (With 5 Figures).- Simulation of the Lithographic Properties of Ion-Beam Resists (With 6 Figures).- Deposition of Masking Films by Ion-Beam Induced Polymerization (With 4 Figures).- VI Measuring Techniques.- Dosimetry and Beam Quality (With 21 Figures).- A New Facility for Ion Beam Surface Analysis (With 6 Figures).- Non-Destructive Techniques for Measuring the Parameters of Low-Energy Continuous Ion Beams (With 5 Figures).- Investigation of the Lifetime of Photocurrent Carriers in Si During Ion Implantation (With 5 Figures).- A Mössbauer Spectrometer for in situ Low Temperature Studies of Ion-Bombarded Metals (With 4 Figures).- Background in (n, p) and (n, ) Spectrometry (With 6 Figures).- Monitoring of X-Y-Scan Quality by Amorphization Contrast on Silicon Wafers (With 4 Figures).- VII Implantation into Metals.- Techniques and Equipment for Implantation into Metals (With 7 Figures).- Nitriding of Steels: Conventional Processes and Ion Implantation (With 5 Figures).- Effect of Ion Mixing on the Wear Behaviour of Silver (With 4Figures).- Methods to Control Target Heating During Ion Implantation (With 5 Figures).- VIII Implantation into Semiconductors.- New Applications of Ion Implantation in Silicon Processing (With 14 Figures).- Limitations of Ion Implantation in MOS Technology (With 13 Figures).- Implant Processes for Bipolar Product Manufacturing and Their Effects on De.…

Taschenbuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -I Machine Aspects of Ion Implantation.- Ion Implantation System Concepts.- Ion Sources.- Faraday Cup Designs for Ion Implantation.- Safety and Ion Implanters.- II Ion Ranges in Solids.- The Stopping and Range of Ions in Solids.- The Calculation of Ion Ranges in Solids with Analytic Solutions.- Range Distributions.- III Measuring Techniques and Annealing.- Electrical Measuring Techniques.- Wafer Mapping Techniques for Characterization of Ion Implantation Processing.- Non-Electrical Measuring Techniques.- Annealing and Residual Damage.- IV Appendix: Modern Ion Implantation Equipment TM.- Evolution and Performance of the Nova NV-10 Predep(TM) Implanter.- Ion Implantation Equipment from Veeco.- The Series III A and IIIX Ion Implanters.- Standard High-Voltage Power Supplies for Ion Implantation.- The IONMICROPROBE A-DIDA 3000-30 for Dopant Depth Profiling and Impurity Bulk Analysis.- List of Contributors.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 392 pp. Englisch.…