perfect. Condizione: Acceptable. Amado, Braulio (illustratore). DAMAGED - Bruise/tear to cover/spine.
Paperback. Condizione: Very Good. No Jacket. Amado, Braulio (illustratore). May have limited writing in cover pages. Pages are unmarked. ~ ThriftBooks: Read More, Spend Less.
Da: ThriftBooks-Atlanta, AUSTELL, GA, U.S.A.
Paperback. Condizione: Very Good. No Jacket. Amado, Braulio (illustratore). May have limited writing in cover pages. Pages are unmarked. ~ ThriftBooks: Read More, Spend Less.
Paperback. Condizione: Very Good. No Jacket. Amado, Braulio (illustratore). May have limited writing in cover pages. Pages are unmarked. ~ ThriftBooks: Read More, Spend Less.
perfect. Condizione: Very Good. Amado, Braulio (illustratore). Very Good Condition - May show some limited signs of wear and may have a remainder mark. Pages and dust cover are intact and not marred by notes or highlighting.
perfect. Condizione: Fine. Amado, Braulio (illustratore). LIKE NEW!!! Has a red or black remainder mark on bottom/exterior edge of pages.
Lingua: Inglese
Editore: Prestel Verlag GmbH & Co KG., 2021
ISBN 10: 3791387561 ISBN 13: 9783791387567
Da: Better World Books, Mishawaka, IN, U.S.A.
Condizione: Very Good. Amado, Braulio (illustratore). Former library copy. Pages intact with possible writing/highlighting. Binding strong with minor wear. Dust jackets/supplements may not be included. Includes library markings. Stock photo provided. Product includes identifying sticker. Better World Books: Buy Books. Do Good.
Da: Big River Books, Powder Springs, GA, U.S.A.
Condizione: very_good. Amado, Braulio (illustratore). This book is in Very Good condition. The cover and pages have minor shelf wear. Binding is tight and pages are intact.
Da: Big River Books, Powder Springs, GA, U.S.A.
Condizione: good. Amado, Braulio (illustratore). This book is in good condition. The cover has minor creases or bends. The binding is tight and pages are intact. Some pages may have writing or highlighting.
perfect. Condizione: New. Amado, Braulio (illustratore).
perfect. Condizione: New. Amado, Braulio (illustratore).
Da: Your Online Bookstore, Houston, TX, U.S.A.
perfect. Condizione: New. Amado, Braulio (illustratore).
Da: Big River Books, Powder Springs, GA, U.S.A.
Condizione: new. Amado, Braulio (illustratore).
perfect. Condizione: Very Good. Amado, Braulio (illustratore). Connecting readers with great books since 1972! Used books may not include companion materials, and may have some shelf wear or limited writing. We ship orders daily and Customer Service is our top priority!
perfect. Condizione: Very Good. Amado, Braulio (illustratore). Connecting readers with great books since 1972! Used books may not include companion materials, and may have some shelf wear or limited writing. We ship orders daily and Customer Service is our top priority!
Da: Bill & Ben Books, Faringdon, Regno Unito
EUR 8,32
Quantità: 8 disponibili
Aggiungi al carrelloPaperback. Condizione: New. Amado, Braulio (illustratore). For decades, LGBTQ travellers have congregated in predictable places: queer-friendly cities like New York and Berlin, or beach towns such as Mykonos and Fire Island. But as progress and visibility expand across the globe, so do queer people's travel options. Drawing on their own extensive travel experiences, as well as the perspectives of local DJs, artists, activists, drag performers, DIY historians, and long-time residents (many of them found through the biggest advantage gay travellers have over their straight counterparts: 'hookup' apps like Grindr and Scruff), the authors of Sassy Planet offer up the latest on what's hot in 40 cities around the world. Traveling in the US? Check out RuPaul's Drag Race star Alaska's recommendations for Pittsburgh, where she first got her start. Planning a trip to Japan? Read about the 300+ queer bars packed into Tokyo's Shinjuku neighbourhood. Even in countries where homosexuality is sanctioned, you'll read about emerging pockets of queer acceptance and culture. You'll also find the very latest info on where to go in major destinations, from the Por Detroit parties in Mexico City to new Brooklyn hot spots. The book features interviews with local celebs, best-of lists, and little- known hideaways all packaged with helpful insights, cool bits of regional culture, queer lore-and of course, plenty of sass to spare.
EUR 14,29
Quantità: 2 disponibili
Aggiungi al carrelloCondizione: good. Amado, Braulio (illustratore). Befriedigend/Good: Durchschnittlich erhaltenes Buch bzw. Schutzumschlag mit Gebrauchsspuren, aber vollständigen Seiten. / Describes the average WORN book or dust jacket that has all the pages present.
EUR 28,65
Quantità: 1 disponibili
Aggiungi al carrelloCondizione: New. Amado, Braulio (illustratore).
Condizione: New. Amado, Braulio (illustratore).
Editore: Prestel, New York, 2021
Da: 32.1 Rare Books + Ephemera, IOBA, ESA, Princeton, NJ, U.S.A.
Membro dell'associazione: IOBA
Softcover. Condizione: Near Fine in color wraps. Square 8vo., 223 pp. Illustrated.
Da: Mooney's bookstore, Den Helder, Paesi Bassi
EUR 37,49
Quantità: 1 disponibili
Aggiungi al carrelloCondizione: Very good. Amado, Braulio (illustratore).
Lingua: Inglese
Editore: LAP LAMBERT Academic Publishing, 2010
ISBN 10: 3838333888 ISBN 13: 9783838333885
Da: preigu, Osnabrück, Germania
EUR 43,30
Quantità: 5 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. Hafnium Oxide And Hafnium Silicate For High-k Application | Characterization of Hafnium Based Oxide Thin Films Deposited by CVD & Plasma-CVD For High-k Application in Transistors | Harish Bhandari | Taschenbuch | 232 S. | Englisch | 2010 | LAP LAMBERT Academic Publishing | EAN 9783838333885 | Verantwortliche Person für die EU: BoD - Books on Demand, In de Tarpen 42, 22848 Norderstedt, info[at]bod[dot]de | Anbieter: preigu.
Lingua: Inglese
Editore: LAP Lambert Academic Publishing, 2010
ISBN 10: 3838333888 ISBN 13: 9783838333885
Da: Books Puddle, New York, NY, U.S.A.
Condizione: New.
Lingua: Inglese
Editore: Lap Lambert Academic Publishing, 2010
ISBN 10: 3838333888 ISBN 13: 9783838333885
Da: Revaluation Books, Exeter, Regno Unito
EUR 154,23
Quantità: 1 disponibili
Aggiungi al carrelloPaperback. Condizione: Brand New. 232 pages. 8.58x5.91x0.63 inches. In Stock.
Lingua: Inglese
Editore: LAP LAMBERT Academic Publishing Sep 2010, 2010
ISBN 10: 3838333888 ISBN 13: 9783838333885
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
EUR 49,00
Quantità: 2 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Novel materials with high-dielectric(k) constants are rapidly gaining attention for their application as gate insulator for future MOS transistors. This book provides the basic principles underlying chemical vapor deposition (CVD) of hafnium oxide and hafnium silicate thin films for high-k application. In addition to the deposition fundamentals, the discussions in the book provide valuable insights to various chemical and physical characterization techniques that can be applied to thin films in general. This easy-to-understand and well- illustrated text is designed for both beginners as well as advanced researchers with a good introduction to the subject of high-k thin films. 232 pp. Englisch.
Lingua: Inglese
Editore: LAP LAMBERT Academic Publishing, 2010
ISBN 10: 3838333888 ISBN 13: 9783838333885
Da: AHA-BUCH GmbH, Einbeck, Germania
EUR 49,00
Quantità: 1 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Novel materials with high-dielectric(k) constants are rapidly gaining attention for their application as gate insulator for future MOS transistors. This book provides the basic principles underlying chemical vapor deposition (CVD) of hafnium oxide and hafnium silicate thin films for high-k application. In addition to the deposition fundamentals, the discussions in the book provide valuable insights to various chemical and physical characterization techniques that can be applied to thin films in general. This easy-to-understand and well- illustrated text is designed for both beginners as well as advanced researchers with a good introduction to the subject of high-k thin films.
Lingua: Inglese
Editore: LAP LAMBERT Academic Publishing, 2010
ISBN 10: 3838333888 ISBN 13: 9783838333885
Da: moluna, Greven, Germania
EUR 63,42
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Bhandari HarishHarish Bhandari received the Bachelors in Chemical Engineering (2000) from Bangalore University, India. He earned his M.S. and Ph.D. (2006) in Chemical Engineering at the University of Alabama. He is currently a Res.
Lingua: Inglese
Editore: LAP Lambert Academic Publishing, 2010
ISBN 10: 3838333888 ISBN 13: 9783838333885
Da: Majestic Books, Hounslow, Regno Unito
EUR 124,19
Quantità: 4 disponibili
Aggiungi al carrelloCondizione: New. Print on Demand.
Lingua: Inglese
Editore: LAP Lambert Academic Publishing, 2010
ISBN 10: 3838333888 ISBN 13: 9783838333885
Da: Biblios, Frankfurt am main, HESSE, Germania
EUR 125,97
Quantità: 4 disponibili
Aggiungi al carrelloCondizione: New. PRINT ON DEMAND.
Lingua: Inglese
Editore: LAP LAMBERT Academic Publishing Sep 2010, 2010
ISBN 10: 3838333888 ISBN 13: 9783838333885
Da: buchversandmimpf2000, Emtmannsberg, BAYE, Germania
EUR 79,00
Quantità: 1 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Novel materials with high-dielectric(k) constants are rapidly gaining attention for their application as gate insulator for future MOS transistors. This book provides the basic principles underlying chemical vapor deposition (CVD) of hafnium oxide and hafnium silicate thin films for high-k application. In addition to the deposition fundamentals, the discussions in the book provide valuable insights to various chemical and physical characterization techniques that can be applied to thin films in general. This easy-to-understand and well- illustrated text is designed for both beginners as well as advanced researchers with a good introduction to the subject of high-k thin films.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 232 pp. Englisch.