Da: ThriftBooks-Atlanta, AUSTELL, GA, U.S.A.
EUR 15,86
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Aggiungi al carrelloHardcover. Condizione: Good. No Jacket. Missing dust jacket; Pages can have notes/highlighting. Spine may show signs of wear. ~ ThriftBooks: Read More, Spend Less 1.55.
Da: Hay-on-Wye Booksellers, Hay-on-Wye, HEREF, Regno Unito
EUR 24,43
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Aggiungi al carrelloCondizione: As New.
Da: Romtrade Corp., STERLING HEIGHTS, MI, U.S.A.
EUR 53,56
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Aggiungi al carrelloCondizione: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
Da: Basi6 International, Irving, TX, U.S.A.
EUR 53,56
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Aggiungi al carrelloCondizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
EUR 57,24
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Aggiungi al carrelloCondizione: New. pp. 672.
EUR 55,28
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Aggiungi al carrelloCondizione: New. pp. 672 Illus.
Da: Revaluation Books, Exeter, Regno Unito
EUR 54,48
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Aggiungi al carrelloHardcover. Condizione: Brand New. 1st edition. 671 pages. 10.00x6.75x2.25 inches. In Stock.
EUR 59,06
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Aggiungi al carrelloCondizione: New. pp. 672.
Da: Toscana Books, AUSTIN, TX, U.S.A.
EUR 43,58
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Aggiungi al carrelloHardcover. Condizione: new. Excellent Condition.Excels in customer satisfaction, prompt replies, and quality checks.
Da: Chiron Media, Wallingford, Regno Unito
EUR 47,05
Convertire valutaQuantità: Più di 20 disponibili
Aggiungi al carrelloHardcover. Condizione: New.
Da: Ria Christie Collections, Uxbridge, Regno Unito
EUR 67,82
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Aggiungi al carrelloCondizione: New. In.
Editore: Elsevier Science & Technology|William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Lingua: Inglese
Da: moluna, Greven, Germania
EUR 73,78
Convertire valutaQuantità: Più di 20 disponibili
Aggiungi al carrelloGebunden. Condizione: New. Offers a look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and x-ray lithography.This han.
EUR 146,02
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Aggiungi al carrelloCondizione: Gut. Zustand: Gut | Seiten: 1022 | Sprache: Englisch | Produktart: Bücher.
Da: Broad Street Books, Branchville, NJ, U.S.A.
EUR 113,40
Convertire valutaQuantità: 1 disponibili
Aggiungi al carrelloHardcover. Condizione: As New. Hardcover book in excellent condition, text is unmarked and pages are tight.
Da: Mispah books, Redhill, SURRE, Regno Unito
EUR 299,35
Convertire valutaQuantità: 1 disponibili
Aggiungi al carrelloHardcover. Condizione: Like New. Like New. book.
Editore: Elsevier Science & Technology, William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Lingua: Inglese
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
EUR 54,95
Convertire valutaQuantità: 2 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook. Englisch.
Editore: Elsevier Science & Technology, William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Lingua: Inglese
Da: AHA-BUCH GmbH, Einbeck, Germania
EUR 65,55
Convertire valutaQuantità: 2 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Da: Brook Bookstore On Demand, Napoli, NA, Italia
EUR 53,13
Convertire valutaQuantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: new. Questo è un articolo print on demand.