Da: Basi6 International, Irving, TX, U.S.A.
Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
Da: Romtrade Corp., STERLING HEIGHTS, MI, U.S.A.
Condizione: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
EUR 53,44
Quantità: 1 disponibili
Aggiungi al carrelloCondizione: New. pp. 672 Illus.
Condizione: New. pp. 672.
Da: Chiron Media, Wallingford, Regno Unito
EUR 45,54
Quantità: Più di 20 disponibili
Aggiungi al carrelloHardcover. Condizione: New.
Da: GreatBookPrices, Columbia, MD, U.S.A.
EUR 62,89
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New.
EUR 54,96
Quantità: 1 disponibili
Aggiungi al carrelloCondizione: New. pp. 672.
Da: GreatBookPrices, Columbia, MD, U.S.A.
EUR 73,35
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: As New. Unread book in perfect condition.
Da: Ria Christie Collections, Uxbridge, Regno Unito
EUR 65,05
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New. In.
Da: GreatBookPricesUK, Woodford Green, Regno Unito
EUR 62,18
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New.
Lingua: Inglese
Editore: Noyes Data Corporation, NJ, 1991
Da: Bob "The Bookman" DePino, ORLANDO, FL, U.S.A.
Prima edizione
Hardcover. Condizione: Very Good. Condizione sovraccoperta: Very Good. First Edition. Edited by William B. Glendinning and John N. Helbert, this 1991 technical volume is a detailed reference work on the science and engineering of microlithography?the core process used to manufacture integrated circuits in microelectronics. The book explains how patterns are transferred onto semiconductor wafers using light, electron beams, and X-ray techniques. It covers both theoretical foundations and practical applications, including photoresist chemistry, optical systems, resolution limits, and process control. Topics such as positive vs. negative resists, thin-film behavior, and defect management are addressed in depth. As part of a broader materials science and process technology series, it compiles contributions from multiple experts, making it a comprehensive snapshot of lithographic technology at the dawn of the modern VLSI (Very Large Scale Integration) era. It is aimed primarily at engineers, researchers, and advanced students working in semiconductor fabrication. THIS "Review Copy" was delivered before the actual publication date of 1/15/1992. Hard cover edition with unclipped dustjacket. 649 pages. Dimensions: 6.25" by 9.5". Published by Noyes Data Corporation, NJ. 1st printing, 1991. B&W illustrations. B&W photographs. Black binding. Dustjacket defect(s): Some tears. Some wrinkling/creasing. 3.25 Pound Media Shipping Rate with Multiple Product Orders. (Min Shipping Rate 1 Pound per Order). Order More and SAVE! Genre(s): Electronics / Technology / Semiconductors / English. (B106).
Da: GreatBookPricesUK, Woodford Green, Regno Unito
EUR 72,00
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: As New. Unread book in perfect condition.
Lingua: Inglese
Editore: Elsevier Science & Technology|William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Da: moluna, Greven, Germania
EUR 73,78
Quantità: Più di 20 disponibili
Aggiungi al carrelloGebunden. Condizione: New. Offers a look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and x-ray lithography.This han.
EUR 29,90
Quantità: 1 disponibili
Aggiungi al carrelloCondizione: Gut. Zustand: Gut | Seiten: 1022 | Sprache: Englisch | Produktart: Bücher | Keine Beschreibung verfügbar.
Da: Mispah books, Redhill, SURRE, Regno Unito
EUR 289,75
Quantità: 1 disponibili
Aggiungi al carrelloHardcover. Condizione: Like New. Like New. book.
Da: Brook Bookstore On Demand, Napoli, NA, Italia
EUR 53,13
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: new. Questo è un articolo print on demand.
Da: Revaluation Books, Exeter, Regno Unito
EUR 52,74
Quantità: 2 disponibili
Aggiungi al carrelloHardcover. Condizione: Brand New. 1st edition. 671 pages. 10.00x6.75x2.25 inches. In Stock. This item is printed on demand.
Da: AHA-BUCH GmbH, Einbeck, Germania
EUR 93,17
Quantità: 2 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
EUR 150,00
Quantità: 2 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook. 672 pp. Englisch.