shikha deep (24 risultati)

Hardcover. Condizione: New. EPEC was the first E. coli strain to be implicated in human disease in the 1940s and 1950s; the mechanisms by which this pathogen induced diarrhoea remained a complete mystery throughout most of the 40 years since its description. It was only during the late 1980s that major advances were made in unravelling the mechanisms behind EPEC pathogenesis. Ever since, progress has been made at a stunning pace and there have been major breakthroughs in identifying the bacterial factors involved in attaching and effacing (A?E) lesion formation, host signal transduction pathways in response to EPEC infection and the genetic basis of EPEC pathogenesis. The rapid pace of discovery is a result of intensive research by investigators in this field and portends that EPEC will soon be among one of the most understood diarrhoea-causing infectious agents. This review aims to trace the progress of EPEC research since its existence was first reported by John Bray in 1945, highlighting the major findings that have revolutionised our understanding of EPEC pathogenesis. It constitutes a significant risk to human health and remains an important cause of infant diarrhoea and mortality in developing countries. EPEC is an important category of diarrhoeagenic E. coli that has been linked to infant diarrhoea in developing countries. The main objectives of the book are screening of enteropathogenic Escherichia coli for bfpA, astA and ecpA genes. 2. Antibiotic sensitivity profile of enteropathogenic Escherichia coli with reference to clinically used antimicrobials.

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Condizione: New.

Hardcover. Condizione: New. ISBN:9789388020831.

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BPM. Condizione: New. New Book. Shipped from UK. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.

BPM. Condizione: New. New Book. Delivered from our UK warehouse in 4 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.

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Taschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.

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Taschenbuch. Condizione: Neu. Chemical Etching Behaviour of a Polyimide | Deep Shikha | Taschenbuch | 28 S. | Englisch | 2015 | GRIN Verlag | EAN 9783668084186 | Verantwortliche Person für die EU: BoD - Books on Demand, In de Tarpen 42, 22848 Norderstedt, info[at]bod[dot]de | Anbieter: preigu.

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Taschenbuch. Condizione: Neu. Ion Implantation in alumina for improved biocompatibility | Surface modification of alumina | Deep Shikha | Taschenbuch | Englisch | LAP Lambert Academic Publishing | EAN 9783847336709 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.

Paperback. Condizione: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

Taschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, Molecular Physics, Solid State Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample. 28 pp. Englisch.

Taschenbuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.Books on Demand GmbH, Überseering 33, 22297 Hamburg 28 pp. Englisch.

Taschenbuch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Words at the Bottom of My Teapot, featuring 11 writers, is an ode to weary readers curling up with a book in the late hours of the night. Just like the title suggests, the poems and stories in the collection will soothe the disturbed, like a warm cup of tea.

Taschenbuch. Condizione: Neu. Words at the Bottom of My Teapot | Deep Shikha (u. a.) | Taschenbuch | Englisch | 2021 | Ukiyoto Publishing | EAN 9789359202372 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld, gpsr[at]libri[dot]de | Anbieter: preigu Print on Demand.

Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Shikha DeepDr. Shikha passed her M. Sc. (Chemistry) in 1997. Birla Institute of Technology provided a platform to carry out inter-disciplinary research of her choice. She completed her Ph.D. (Science) in 1998 after which she joined t.

Taschenbuch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Among the most important challenges of modern material engineering is to repair ill or damaged organs of the human body. Ceramic materials have various superior characteristics in mechanical properties, heat resistance and chemical stability. Therefore, ceramics have been considered as the candidate for biomaterials used for tooth root and artificial bone. Among the ceramics, alumina is being widely used as hard tissue replacement. Despite having the assets for its effective use as hard tissue implant materials, it has some major drawbacks. Though alumina is inert, but it is corrodible in body solution, which may lead to failure of the implant. Another major drawback is its rigidity and brittleness. In this work, we have tried to improve the properties of alumina by nitrogen ion implantation for its use as potential hard tissue replacement. Ion implantation offers an unrivalled tool for tailoring of the surface properties, making possible to design new biocompatible materials characterized by superior mechanical and biological properties. In this work we have improved the surface properties of alumina without changing the bulk properties by nitrogen ion implantation.