Isbn: 9780815515937 - sputtering materials for vlsi and thin film devices (15 risultati)

Condizione: Very Good. : Este libro es un recurso importante para estudiantes, ingenieros e investigadores que trabajan en el área de la deposición de películas delgadas utilizando la deposición física de vapor (por ejemplo, la pulverización catódica) para semiconductores, pantallas de cristal líquido, medios de grabación de alta densidad y fabricación de dispositivos fotovoltaicos (por ejemplo, células solares de película delgada). También revisa temas de la industria microelectrónica como la historia de los inventos y las tendencias tecnológicas, los desarrollos recientes en tecnologías de pulverización catódica, los pasos de fabricación que requieren la pulverización catódica de películas delgadas, las propiedades de las películas delgadas y el papel del rendimiento del objetivo de pulverización catódica en la productividad general de varios procesos. EAN: 9780815515937 Tipo: Libros Categoría: Tecnología Título: Sputtering Materials for VLSI and Thin Film Devices Autor: Jaydeep Sarkar Idioma: en Formato: Tapa dura.…

Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.

Hardcover. Condizione: New. Brand new book, sourced directly from publisher. Dispatch time is 9-10 days from our warehouse. Book will be sent in robust, secure packaging to ensure it reaches you securely.

Hardcover. Condizione: Brand New. 1st edition. 608 pages. 9.25x7.50x1.75 inches. In Stock.

Hardcover. Condizione: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

Hardcover. Condizione: new. Hardcover. Sputtering Materials for VLSI and Thin Film Devices Reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Shipping may be from multiple locations in the US or from the UK, depending on stock availability.…

hardcover. Condizione: New. Special order direct from the distributor.

Condizione: New. Reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Num Pages: 608 pages, illustrations. BIC Classification: TJFD5. Category: (P) Professional & Vocational. Dimension: 235 x 190. Weight in Grams: 1300. . 2010. Illustrated. hardcover. . . . .…

Condizione: New. Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs.

Hardcover. Condizione: Brand New. 1st edition. 608 pages. 9.25x7.50x1.75 inches. In Stock.

Condizione: New. Reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Num Pages: 608 pages, illustrations. BIC Classification: TJFD5. Category: (P) Professional & Vocational. Dimension: 235 x 190. Weight in Grams: 1300. . 2010. Illustrated. hardcover. . . . . Books ship from the US and Ireland.…

Hardcover. Condizione: new. Hardcover. Sputtering Materials for VLSI and Thin Film Devices Reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability.…

Condizione: new. Questo è un articolo print on demand.

Buch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . 608 pp. Englisch.…

Buch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. .…