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Da: Biblios, Frankfurt am main, HESSE, Germania
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Da: GreatBookPrices, Columbia, MD, U.S.A.
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Lingua: Inglese
Editore: World Scientific Europe Ltd, 2019
ISBN 10: 1786347156 ISBN 13: 9781786347152
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Aggiungi al carrelloCondizione: Hervorragend. Zustand: Hervorragend | Seiten: 404 | Sprache: Englisch | Produktart: Bücher | This work presents a comprehensive theory describing atomic diffusion in silicon crystals under strong nonequilibrium conditions caused by ion implantation and interaction with the surface or other interfaces. A set of generalized equations that describe diffusion of impurity atoms and point defects are presented in a form suitable for solving numerically. Based on this theory, partial diffusion models are constructed, and the simulation of many doping processes used in microelectronics is carried out.Coupled Diffusion of Impurity Atoms and Point Defects in Silicon Crystals is a useful text for researchers, engineers, and advanced students in semiconductor physics, microelectronics, and nanoelectronics. It helps readers acquire a deep understanding of the physics of diffusion and demonstrates the practical application of the theoretical ideas formulated to find cheaper solutions in the course of manufacturing semiconductor devices and integrated microcircuits.
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ISBN 10: 1786347156 ISBN 13: 9781786347152
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ISBN 10: 1786347156 ISBN 13: 9781786347152
Da: Revaluation Books, Exeter, Regno Unito
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Aggiungi al carrelloHardcover. Condizione: Brand New. 370 pages. 9.50x6.50x1.00 inches. In Stock.
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ISBN 10: 1786347156 ISBN 13: 9781786347152
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EUR 143,18
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Aggiungi al carrelloCondizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. KlappentextrnrnThis work presents a comprehensive theory describing atomic diffusion in silicon crystals under strong nonequilibrium conditions caused by ion implantation and interaction with the surface or other interfaces. A set of generalized.
Da: preigu, Osnabrück, Germania
EUR 148,45
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Aggiungi al carrelloBuch. Condizione: Neu. COUPLED DIFFUSION IMPURITY ATOMS & POINT DEFECTS SILICON | Velichko Oleg | Buch | Gebunden | Englisch | 2019 | WSPC (Europe) | EAN 9781786347152 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld, gpsr[at]libri[dot]de | Anbieter: preigu Print on Demand.
Da: AHA-BUCH GmbH, Einbeck, Germania
EUR 177,41
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Aggiungi al carrelloBuch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This work presents a comprehensive theory describing atomic diffusion in silicon crystals under strong nonequilibrium conditions caused by ion implantation and interaction with the surface or other interfaces. A set of generalized equations that describe diffusion of impurity atoms and point defects are presented in a form suitable for solving numerically. Based on this theory, partial diffusion models are constructed, and the simulation of many doping processes used in microelectronics is carried out.Coupled Diffusion of Impurity Atoms and Point Defects in Silicon Crystals is a useful text for researchers, engineers, and advanced students in semiconductor physics, microelectronics, and nanoelectronics. It helps readers acquire a deep understanding of the physics of diffusion and demonstrates the practical application of the theoretical ideas formulated to find cheaper solutions in the course of manufacturing semiconductor devices and integrated microcircuits.