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Da: Ria Christie Collections, Uxbridge, Regno Unito
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Da: GreatBookPricesUK, Woodford Green, Regno Unito
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Condizione: New. pp. 240.
Da: GreatBookPricesUK, Woodford Green, Regno Unito
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EUR 79,92
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Aggiungi al carrelloHardcover. Condizione: Brand New. 178 pages. 9.50x6.50x0.75 inches. In Stock.
Lingua: Inglese
Editore: Springer International Publishing, 2015
ISBN 10: 3319203843 ISBN 13: 9783319203843
Da: AHA-BUCH GmbH, Einbeck, Germania
EUR 53,49
Quantità: 1 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
EUR 43,31
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Aggiungi al carrelloCondizione: Sehr gut. Zustand: Sehr gut | Sprache: Englisch | Produktart: Bücher | This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Da: Brook Bookstore On Demand, Napoli, NA, Italia
EUR 46,22
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Aggiungi al carrelloCondizione: new. Questo è un articolo print on demand.
Lingua: Inglese
Editore: Springer International Publishing Nov 2015, 2015
ISBN 10: 3319203843 ISBN 13: 9783319203843
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
EUR 53,49
Quantità: 2 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. 176 pp. Englisch.
Da: Majestic Books, Hounslow, Regno Unito
EUR 76,15
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Aggiungi al carrelloCondizione: New. Print on Demand pp. 240.
Da: Biblios, Frankfurt am main, HESSE, Germania
EUR 75,92
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Aggiungi al carrelloCondizione: New. PRINT ON DEMAND pp. 240.
Lingua: Inglese
Editore: Springer International Publishing, 2015
ISBN 10: 3319203843 ISBN 13: 9783319203843
Da: moluna, Greven, Germania
EUR 48,37
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Aggiungi al carrelloCondizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Enables readers to tackle the challenge of layout decompositions for different patterning techniquesPresents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly de.
Lingua: Inglese
Editore: Springer, Springer Nov 2015, 2015
ISBN 10: 3319203843 ISBN 13: 9783319203843
Da: buchversandmimpf2000, Emtmannsberg, BAYE, Germania
EUR 53,49
Quantità: 1 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography.Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 176 pp. Englisch.