9783540856115 - extended defects in germanium: fundamental and technological aspects: 118 di claeys, cor; simoen, eddy (14 risultati)

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  • Lingua: Inglese

    Editore: Springer, 2009

    3540856110 / 9783540856115

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  • Lingua: Inglese

    Editore: Springer, 2009

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    Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.

  • Lingua: Inglese

    Editore: Springer, 2009

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  • Lingua: Inglese

    Editore: Springer, 2009

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    Da: Basi6 International, Irving, TX, U.S.A.Basi6 International

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  • Lingua: Inglese

    Editore: Springer, 2009

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  • Lingua: Inglese

    Editore: Springer, 2009

    3540856110 / 9783540856115

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    Da: Ria Christie Collections, Uxbridge, Regno UnitoRia Christie Collections

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  • Lingua: Inglese

    Editore: Springer, 2009

    3540856110 / 9783540856115

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    Da: Buchpark, Trebbin, GermaniaBuchpark

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    Condizione: Sehr gut. Zustand: Sehr gut | Seiten: 324 | Sprache: Englisch | Produktart: Bücher | Keine Beschreibung verfügbar.

  • Lingua: Inglese

    Editore: Springer, 2009

    3540856110 / 9783540856115

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    Da: AHA-BUCH GmbH, Einbeck, GermaniaAHA-BUCH GmbH

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    Buch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - The aim is to give an overview of the physics of extended defects in Germanium, i.e. dislocations (line defects), grain boundaries, stacking faults, twins and {311} defects (two-dimensional defects) and precipitates, bubbles, etc. The first part covers fundamentals, describing the crystallographic structure and other physical and electrical properties, mainly of dislocations. Since dislocations are essential for the plastic deformation of Germanium, methods for analysis and imaging of dislocations and to evaluate their structure are described. Attention is given to the electrical and optical properties, which are important for devices made in dislocated Ge. The second part treats the creation of extended defects during wafer and device processing. Issues are addressed such as defect formation during ion implantation, necessary to create junctions, which are an essential part in every device type. Extended defects are also created during the deposition of thin or thick epitaxial layers on other substrates, which are important for optoelectronic and photovoltaic applications. In brief, the book is intended to provide a fundamental understanding of the extended-defect formation during Ge materials and device processing, providing ways to distinguish harmful from less detrimental defects and should point out ways for defect engineering and control.

  • Lingua: Inglese

    Editore: Springer-Verlag Berlin And Heidelberg Gmbh & Co. Kg, 2009

    3540856110 / 9783540856115

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    Da: Revaluation Books, Exeter, Regno UnitoRevaluation Books

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    Hardcover. Condizione: Brand New. 1st edition. 320 pages. 9.75x6.75x0.75 inches. In Stock.

  • Lingua: Inglese

    Editore: Springer, 2009

    3540856110 / 9783540856115

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    Da: Mispah books, Redhill, SURRE, Regno UnitoMispah books

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    Condizione: Usato - Come nuovo

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    Hardcover. Condizione: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

  • Lingua: Inglese

    Editore: Prentice Hall, 2009

    3540856110 / 9783540856115

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    Da: Brook Bookstore On Demand, Napoli, NA, ItaliaBrook Bookstore On Demand

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    Condizione: new. Questo è un articolo print on demand.

  • Lingua: Inglese

    Editore: Springer Berlin Heidelberg, Springer Berlin Heidelberg Feb 2009, 2009

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    Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermaniaBuchWeltWeit Ludwig Meier e.K.

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    EUR 160,49

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    Buch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The aim is to give an overview of the physics of extended defects in Germanium, i.e. dislocations (line defects), grain boundaries, stacking faults, twins and {311} defects (two-dimensional defects) and precipitates, bubbles, etc. The first part covers fundamentals, describing the crystallographic structure and other physical and electrical properties, mainly of dislocations. Since dislocations are essential for the plastic deformation of Germanium, methods for analysis and imaging of dislocations and to evaluate their structure are described. Attention is given to the electrical and optical properties, which are important for devices made in dislocated Ge. The second part treats the creation of extended defects during wafer and device processing. Issues are addressed such as defect formation during ion implantation, necessary to create junctions, which are an essential part in every device type. Extended defects are also created during the deposition of thin or thick epitaxial layers on other substrates, which are important for optoelectronic and photovoltaic applications. In brief, the book is intended to provide a fundamental understanding of the extended-defect formation during Ge materials and device processing, providing ways to distinguish harmful from less detrimental defects and should point out ways for defect engineering and control. 324 pp. Englisch.

  • Lingua: Inglese

    Editore: Springer Berlin Heidelberg, 2009

    3540856110 / 9783540856115

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    Da: moluna, Greven, Germaniamoluna

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    Gebunden. Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Deals with all aspects of defects in Ge, an element which is gaining importance again in semiconductor technologyDiscusses all kinds of expanded defects in Ge, such as dislocation, stacking faults, twins, grain boundaries and bubbles on a crystall.

  • Lingua: Inglese

    Editore: Springer Berlin Heidelberg, Springer Berlin Heidelberg Feb 2009, 2009

    3540856110 / 9783540856115

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    Da: buchversandmimpf2000, Emtmannsberg, BAYE, Germaniabuchversandmimpf2000

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    EUR 160,49

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    Buch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The aim is to give an overview of the physics of extended defects in Germanium, i.e. dislocations (line defects), grain boundaries, stacking faults, twins and {311} defects (two-dimensional defects) and precipitates, bubbles, etc. The first part covers fundamentals, describing the crystallographic structure and other physical and electrical properties, mainly of dislocations. Since dislocations are essential for the plastic deformation of Germanium, methods for analysis and imaging of dislocations and to evaluate their structure are described. Attention is given to the electrical and optical properties, which are important for devices made in dislocated Ge. The second part treats the creation of extended defects during wafer and device processing. Issues are addressed such as defect formation during ion implantation, necessary to create junctions, which are an essential part in every device type. Extended defects are also created during the deposition of thin or thick epitaxial layers on other substrates, which are important for optoelectronic and photovoltaic applications. In brief, the book is intended to provide a fundamental understanding of the extended-defect formation during Ge materials and device processing, providing ways to distinguish harmful from less detrimental defects and should point out ways for defect engineering and control.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 324 pp. Englisch.