Da: Buchpark, Trebbin, Germania
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Da: Ria Christie Collections, Uxbridge, Regno Unito
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Da: GreatBookPricesUK, Woodford Green, Regno Unito
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Da: GreatBookPrices, Columbia, MD, U.S.A.
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Da: GreatBookPricesUK, Woodford Green, Regno Unito
EUR 179,59
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Aggiungi al carrelloCondizione: As New. Unread book in perfect condition.
Da: Books Puddle, New York, NY, U.S.A.
Condizione: New. pp. 224.
Da: Books Puddle, New York, NY, U.S.A.
Condizione: New. pp. 224.
Lingua: Inglese
Editore: Springer-Verlag New York Inc., US, 2010
ISBN 10: 1441965874 ISBN 13: 9781441965875
Da: Rarewaves.com USA, London, LONDO, Regno Unito
EUR 224,26
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Aggiungi al carrelloHardback. Condizione: New. 2010 ed. Wafer-scale integration has long been the dream of system designers. Instead of chopping a wafer into a few hundred or a few thousand chips, one would just connect the circuits on the entire wafer. What an enormous capability wafer-scale integration would offer: all those millions of circuits connected by high-speed on-chip wires. Unfortunately, the best known optical systems can provide suitably ?ne resolution only over an area much smaller than a whole wafer. There is no known way to pattern a whole wafer with transistors and wires small enough for modern circuits. Statistical defects present a ?rmer barrier to wafer-scale integration. Flaws appear regularly in integrated circuits; the larger the circuit area, the more probable there is a ?aw. If such ?aws were the result only of dust one might reduce their numbers, but ?aws are also the inevitable result of small scale. Each feature on a modern integrated circuit is carved out by only a small number of photons in the lithographic process. Each transistor gets its electrical properties from only a small number of impurity atoms in its tiny area. Inevitably, the quantized nature of light and the atomic nature of matter produce statistical variations in both the number of photons de?ning each tiny shape and the number of atoms providing the electrical behavior of tiny transistors. No known way exists to eliminate such statistical variation, nor may any be possible.
Da: AHA-BUCH GmbH, Einbeck, Germania
EUR 165,03
Quantità: 1 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Wafer-scale integration has long been the dream of system designers. Instead of chopping a wafer into a few hundred or a few thousand chips, one would just connect the circuits on the entire wafer. What an enormous capability wafer-scale integration would offer: all those millions of circuits connected by high-speed on-chip wires. Unfortunately, the best known optical systems can provide suitably ne resolution only over an area much smaller than a whole wafer. There is no known way to pattern a whole wafer with transistors and wires small enough for modern circuits. Statistical defects present a rmer barrier to wafer-scale integration. Flaws appear regularly in integrated circuits; the larger the circuit area, the more probable there is a aw. If such aws were the result only of dust one might reduce their numbers, but aws are also the inevitable result of small scale. Each feature on a modern integrated circuit is carved out by only a small number of photons in the lithographic process. Each transistor gets its electrical properties from only a small number of impurity atoms in its tiny area. Inevitably, the quantized nature of light and the atomic nature of matter produce statistical variations in both the number of photons de ning each tiny shape and the number of atoms providing the electrical behavior of tiny transistors. No known way exists to eliminate such statistical variation, nor may any be possible.
Da: AHA-BUCH GmbH, Einbeck, Germania
EUR 166,62
Quantità: 2 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Wafer-scale integration has long been the dream of system designers. Instead of chopping a wafer into a few hundred or a few thousand chips, one would just connect the circuits on the entire wafer. What an enormous capability wafer-scale integration would offer: all those millions of circuits connected by high-speed on-chip wires. Unfortunately, the best known optical systems can provide suitably ne resolution only over an area much smaller than a whole wafer. There is no known way to pattern a whole wafer with transistors and wires small enough for modern circuits. Statistical defects present a rmer barrier to wafer-scale integration. Flaws appear regularly in integrated circuits; the larger the circuit area, the more probable there is a aw. If such aws were the result only of dust one might reduce their numbers, but aws are also the inevitable result of small scale. Each feature on a modern integrated circuit is carved out by only a small number of photons in the lithographic process. Each transistor gets its electrical properties from only a small number of impurity atoms in its tiny area. Inevitably, the quantized nature of light and the atomic nature of matter produce statistical variations in both the number of photons de ning each tiny shape and the number of atoms providing the electrical behavior of tiny transistors. No known way exists to eliminate such statistical variation, nor may any be possible.
Lingua: Inglese
Editore: Springer-Verlag New York Inc., 2012
ISBN 10: 1461426170 ISBN 13: 9781461426172
Da: Revaluation Books, Exeter, Regno Unito
EUR 228,96
Quantità: 2 disponibili
Aggiungi al carrelloPaperback. Condizione: Brand New. 222 pages. 9.20x6.10x0.51 inches. In Stock.
Da: Mispah books, Redhill, SURRE, Regno Unito
EUR 224,35
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Aggiungi al carrelloPaperback. Condizione: Like New. Like New. book.
Lingua: Inglese
Editore: Springer-Verlag New York Inc., US, 2010
ISBN 10: 1441965874 ISBN 13: 9781441965875
Da: Rarewaves.com UK, London, Regno Unito
EUR 213,23
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Aggiungi al carrelloHardback. Condizione: New. 2010 ed. Wafer-scale integration has long been the dream of system designers. Instead of chopping a wafer into a few hundred or a few thousand chips, one would just connect the circuits on the entire wafer. What an enormous capability wafer-scale integration would offer: all those millions of circuits connected by high-speed on-chip wires. Unfortunately, the best known optical systems can provide suitably ?ne resolution only over an area much smaller than a whole wafer. There is no known way to pattern a whole wafer with transistors and wires small enough for modern circuits. Statistical defects present a ?rmer barrier to wafer-scale integration. Flaws appear regularly in integrated circuits; the larger the circuit area, the more probable there is a ?aw. If such ?aws were the result only of dust one might reduce their numbers, but ?aws are also the inevitable result of small scale. Each feature on a modern integrated circuit is carved out by only a small number of photons in the lithographic process. Each transistor gets its electrical properties from only a small number of impurity atoms in its tiny area. Inevitably, the quantized nature of light and the atomic nature of matter produce statistical variations in both the number of photons de?ning each tiny shape and the number of atoms providing the electrical behavior of tiny transistors. No known way exists to eliminate such statistical variation, nor may any be possible.
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
EUR 160,49
Quantità: 2 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Wafer-scale integration has long been the dream of system designers. Instead of chopping a wafer into a few hundred or a few thousand chips, one would just connect the circuits on the entire wafer. What an enormous capability wafer-scale integration would offer: all those millions of circuits connected by high-speed on-chip wires. Unfortunately, the best known optical systems can provide suitably ne resolution only over an area much smaller than a whole wafer. There is no known way to pattern a whole wafer with transistors and wires small enough for modern circuits. Statistical defects present a rmer barrier to wafer-scale integration. Flaws appear regularly in integrated circuits; the larger the circuit area, the more probable there is a aw. If such aws were the result only of dust one might reduce their numbers, but aws are also the inevitable result of small scale. Each feature on a modern integrated circuit is carved out by only a small number of photons in the lithographic process. Each transistor gets its electrical properties from only a small number of impurity atoms in its tiny area. Inevitably, the quantized nature of light and the atomic nature of matter produce statistical variations in both the number of photons de ning each tiny shape and the number of atoms providing the electrical behavior of tiny transistors. No known way exists to eliminate such statistical variation, nor may any be possible. 206 pp. Englisch.
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
EUR 160,49
Quantità: 2 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Wafer-scale integration has long been the dream of system designers. Instead of chopping a wafer into a few hundred or a few thousand chips, one would just connect the circuits on the entire wafer. What an enormous capability wafer-scale integration would offer: all those millions of circuits connected by high-speed on-chip wires. Unfortunately, the best known optical systems can provide suitably ne resolution only over an area much smaller than a whole wafer. There is no known way to pattern a whole wafer with transistors and wires small enough for modern circuits. Statistical defects present a rmer barrier to wafer-scale integration. Flaws appear regularly in integrated circuits; the larger the circuit area, the more probable there is a aw. If such aws were the result only of dust one might reduce their numbers, but aws are also the inevitable result of small scale. Each feature on a modern integrated circuit is carved out by only a small number of photons in the lithographic process. Each transistor gets its electrical properties from only a small number of impurity atoms in its tiny area. Inevitably, the quantized nature of light and the atomic nature of matter produce statistical variations in both the number of photons de ning each tiny shape and the number of atoms providing the electrical behavior of tiny transistors. No known way exists to eliminate such statistical variation, nor may any be possible. 224 pp. Englisch.
Da: moluna, Greven, Germania
EUR 136,16
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Aggiungi al carrelloCondizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Serves as a collection of the best-known-methods and ideas from leaders in the field.Includes a carefully-selected set of discussions on the important issues, tradeoffs, and techniques in coupled data I/O.Provides an overview of the circuit.
Da: moluna, Greven, Germania
EUR 137,26
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Serves as a collection of the best-known-methods and ideas from leaders in the field.Includes a carefully-selected set of discussions on the important issues, tradeoffs, and techniques in coupled data I/O.Provides an overview of the circuit.
Da: preigu, Osnabrück, Germania
EUR 141,30
Quantità: 5 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. Coupled Data Communication Techniques for High-Performance and Low-Power Computing | Robert Drost (u. a.) | Taschenbuch | xvi | Englisch | 2012 | Springer | EAN 9781461426172 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand.
Da: Majestic Books, Hounslow, Regno Unito
EUR 211,98
Quantità: 4 disponibili
Aggiungi al carrelloCondizione: New. Print on Demand pp. 224 183 Illus.
Da: Majestic Books, Hounslow, Regno Unito
EUR 213,30
Quantità: 4 disponibili
Aggiungi al carrelloCondizione: New. Print on Demand pp. 224 Illus.
Lingua: Inglese
Editore: Springer US, Springer US Sep 2012, 2012
ISBN 10: 1461426170 ISBN 13: 9781461426172
Da: buchversandmimpf2000, Emtmannsberg, BAYE, Germania
EUR 160,49
Quantità: 1 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Wafer-scale integration has long been the dream of system designers. Instead of chopping a wafer into a few hundred or a few thousand chips, one would just connect the circuits on the entire wafer. What an enormous capability wafer-scale integration would offer: all those millions of circuits connected by high-speed on-chip wires. Unfortunately, the best known optical systems can provide suitably ne resolution only over an area much smaller than a whole wafer. There is no known way to pattern a whole wafer with transistors and wires small enough for modern circuits. Statistical defects present a rmer barrier to wafer-scale integration. Flaws appear regularly in integrated circuits; the larger the circuit area, the more probable there is a aw. If such aws were the result only of dust one might reduce their numbers, but aws are also the inevitable result of small scale. Each feature on a modern integrated circuit is carved out by only a small number of photons in the lithographic process. Each transistor gets its electrical properties from only a small number of impurity atoms in its tiny area. Inevitably, the quantized nature of light and the atomic nature of matter produce statistical variations in both the number of photons de ning each tiny shape and the number of atoms providing the electrical behavior of tiny transistors. No known way exists to eliminate such statistical variation, nor may any be possible.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 224 pp. Englisch.
Da: Biblios, Frankfurt am main, HESSE, Germania
EUR 216,33
Quantità: 4 disponibili
Aggiungi al carrelloCondizione: New. PRINT ON DEMAND pp. 224.
Da: Biblios, Frankfurt am main, HESSE, Germania
EUR 217,61
Quantità: 4 disponibili
Aggiungi al carrelloCondizione: New. PRINT ON DEMAND pp. 224.