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The Mindful Marriage: Create Your Best Relationship Through Understanding and Managing Yourself
Da: Goodwill Books, Hillsboro, OR, U.S.A.
Valutazione del venditore 5 su 5 stelle
Condizione: acceptable. Fairly worn, but readable and intact. If applicable: Dust jacket, disc or access code may not be included.
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The Mindful Marriage: Create Your Best Relationship Through Understanding and Managing Yourself
Da: Goodwill Books, Hillsboro, OR, U.S.A.
Valutazione del venditore 5 su 5 stelle
Condizione: good. Signs of wear and consistent use.
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hardcover. Condizione: Very Good. Connecting readers with great books since 1972! Used books may not include companion materials, and may have some shelf wear or limited writing. We ship orders daily and Customer Service is our top priority!
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The Mindful Marriage: Create Your Best Relationship Through Understanding and Managing Yourself
Da: Idaho Youth Ranch Books, Boise, ID, U.S.A.
Valutazione del venditore 5 su 5 stelle
Condizione: Very Good. A copy that has been read, but remains in excellent condition. Pages are intact and are not marred by notes or highlighting. The spine remains undamaged. There are no stickers on book or rips in dust cover.
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The Mindful Marriage: Create Your Best Relationship Through Understanding and Managing Yourself
Da: California Books, Miami, FL, U.S.A.
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EUR 18,00
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The Mindful Marriage: Create Your Best Relationship Through Understanding and Managing Yourself
Da: California Books, Miami, FL, U.S.A.
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EUR 23,40
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The Mindful Marriage: Create Your Best Relationship Through Understanding and Managing Yourself
Da: Books Puddle, New York, NY, U.S.A.
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Condizione: New.
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The Physics and Chemistry of Sio2 and the Si-Sio2 Interface
Da: ThriftBooks-Dallas, Dallas, TX, U.S.A.
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Hardcover. Condizione: Very Good. No Jacket. May have limited writing in cover pages. Pages are unmarked. ~ ThriftBooks: Read More, Spend Less.
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The Mindful Marriage: Create Your Best Relationship Through Understanding and Managing Yourself
Da: Majestic Books, Hounslow, Regno Unito
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EUR 28,69
Spedizione EUR 7,65
Spedito da Regno Unito a U.S.A.Quantità: 3 disponibili
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The Mindful Marriage: Create Your Best Relationship Through Understanding and Managing Yourself
Da: Biblios, Frankfurt am main, HESSE, Germania
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EUR 38,34
Spedizione EUR 9,95
Spedito da Germania a U.S.A.Quantità: 3 disponibili
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface Deal, B.E. and Helms, C.R.
Da: Aragon Books Canada, OTTAWA, ON, Canada
Valutazione del venditore 3 su 5 stelle
EUR 99,00
Spedizione EUR 20,10
Spedito da Canada a U.S.A.Quantità: 1 disponibili
Aggiungi al carrelloPaperback. Condizione: New.
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Maternal-fetal and Neonatal Endocrinology : Physiology, Pathophysiology and Clinical Management
Da: GreatBookPrices, Columbia, MD, U.S.A.
Valutazione del venditore 5 su 5 stelle
Condizione: New.
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Maternal-fetal and Neonatal Endocrinology : Physiology, Pathophysiology and Clinical Management
Da: GreatBookPricesUK, Woodford Green, Regno Unito
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EUR 221,37
Spedizione EUR 17,66
Spedito da Regno Unito a U.S.A.Quantità: 3 disponibili
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2
Da: Ria Christie Collections, Uxbridge, Regno Unito
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EUR 229,29
Spedizione EUR 14,11
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2
Da: Ria Christie Collections, Uxbridge, Regno Unito
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EUR 229,29
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface
Da: Ria Christie Collections, Uxbridge, Regno Unito
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EUR 229,29
Spedizione EUR 14,11
Spedito da Regno Unito a U.S.A.Quantità: Più di 20 disponibili
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface
Da: Ria Christie Collections, Uxbridge, Regno Unito
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EUR 229,29
Spedizione EUR 14,11
Spedito da Regno Unito a U.S.A.Quantità: Più di 20 disponibili
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Maternal-fetal and Neonatal Endocrinology : Physiology, Pathophysiology and Clinical Management
Da: GreatBookPrices, Columbia, MD, U.S.A.
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Condizione: As New. Unread book in perfect condition.
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EUR 162,03
Spedizione EUR 105,00
Spedito da Germania a U.S.A.Quantità: 1 disponibili
Aggiungi al carrelloCondizione: Sehr gut. Zustand: Sehr gut | Seiten: 524 | Sprache: Englisch | Produktart: Bücher | The first international symposium on the subject "The Physics and Chemistry of Si02 and the Si-Si02 Interface," organized in association with the Electrochemical Society, Inc. , was held in Atlanta, Georgia on May 15- 20, 1988. This symposium contained sixty papers and was so successful that the sponsoring divisions decided to schedule it on a regular basis every four years. Thus, the second symposium on "The Physics and Chemistry of Si02 and the Si02 Interface was held May 18-21, 1992 in St. Louis, Missouri, again sponsored by the Electronics and Dielectrics Science and Technology Divisions of The Electrochemical Society. This volume contains manuscripts of most of the fifty nine papers presented at the 1992 symposium, and is divided into eight chapters - approximating the organization of the symposium. Each chapter is preceded with an introduction by the session organizers. It is appropriate to provide a general assessment of the current status and understanding of the physics and chemistry of Si02 and the Si02 interface before proceeding with a brief overview of the individual chapters. Semiconductor devices have continued to scale down in both horizontal and vertical dimensions. This has resulted in thinner gate and field oxides as well as much closer spacing of individual device features. As a result, surface condition, native oxide composition, and cleaning and impurity effects now provide a much more significant contribution to the properties of oxides and their interfaces.
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Maternal-fetal and Neonatal Endocrinology : Physiology, Pathophysiology and Clinical Management
Da: GreatBookPricesUK, Woodford Green, Regno Unito
Valutazione del venditore 5 su 5 stelle
EUR 261,55
Spedizione EUR 17,66
Spedito da Regno Unito a U.S.A.Quantità: 3 disponibili
Aggiungi al carrelloCondizione: As New. Unread book in perfect condition.
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The Physics and Chemistry of Sio2 and the Si-Sio2 Interface 2
Da: Books Puddle, New York, NY, U.S.A.
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Condizione: New. pp. 520.
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface
Da: Books Puddle, New York, NY, U.S.A.
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Condizione: New. pp. 572.
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2
Da: Books Puddle, New York, NY, U.S.A.
Valutazione del venditore 4 su 5 stelle
Condizione: New. pp. 524.
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface
Da: Books Puddle, New York, NY, U.S.A.
Valutazione del venditore 4 su 5 stelle
Condizione: New. pp. 572.
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EUR 223,11
Spedizione EUR 63,90
Spedito da Germania a U.S.A.Quantità: 1 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - The first international symposium on the subject 'The Physics and Chemistry of Si02 and the Si-Si02 Interface,' organized in association with the Electrochemical Society, Inc. , was held in Atlanta, Georgia on May 15- 20, 1988. This symposium contained sixty papers and was so successful that the sponsoring divisions decided to schedule it on a regular basis every four years. Thus, the second symposium on 'The Physics and Chemistry of Si02 and the Si02 Interface was held May 18-21, 1992 in St. Louis, Missouri, again sponsored by the Electronics and Dielectrics Science and Technology Divisions of The Electrochemical Society. This volume contains manuscripts of most of the fifty nine papers presented at the 1992 symposium, and is divided into eight chapters - approximating the organization of the symposium. Each chapter is preceded with an introduction by the session organizers. It is appropriate to provide a general assessment of the current status and understanding of the physics and chemistry of Si02 and the Si02 interface before proceeding with a brief overview of the individual chapters. Semiconductor devices have continued to scale down in both horizontal and vertical dimensions. This has resulted in thinner gate and field oxides as well as much closer spacing of individual device features. As a result, surface condition, native oxide composition, and cleaning and impurity effects now provide a much more significant contribution to the properties of oxides and their interfaces.
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface
Lingua: Inglese
Editore: Springer US, Springer New York, 2013
ISBN 10: 1489907769 ISBN 13: 9781489907769
EUR 223,11
Spedizione EUR 64,28
Spedito da Germania a U.S.A.Quantità: 1 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - The properties of Si02 and the Si-Si02 interface provide the key foundation onto which the majority of semiconductor device technology has been built Their study has consumed countless hours of many hundreds of investigators over the years, not only in the field of semiconductor devices but also in ceramics, materials science, metallurgy, geology, and mineralogy, to name a few. These groups seldom have contact with each other even though they often investigate quite similar aspects of the Si02 system. Desiring to facilitate an interaction between these groups we set out to organize a symposium on the Physics and Chemistry of Si()z and the Si-Si()z Interface under the auspices of The Electrochemical Society, which represents a number of the appropriate groups. This symposium was held at the 173rd Meeting of The Electrochemical Society in Atlanta, Georgia, May 15-20, 1988. These dates nearly coincided with the ten year anniversary of the 'International Topical Conference on the Physics of Si02 and its Interfaces' held at mM in 1978. We have modeled the present symposium after the 1978 conference as well as its follow on at North Carolina State in 1980. Of course, much progress has been made in that ten years and the symposium has given us the opportunity to take a multidisciplinary look at that progress.
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2
Lingua: Inglese
Editore: Springer US, Springer New York, 1993
ISBN 10: 0306444194 ISBN 13: 9780306444197
EUR 225,03
Spedizione EUR 65,86
Spedito da Germania a U.S.A.Quantità: 1 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - The first international symposium on the subject 'The Physics and Chemistry of Si02 and the Si-Si02 Interface,' organized in association with the Electrochemical Society, Inc. , was held in Atlanta, Georgia on May 15- 20, 1988. This symposium contained sixty papers and was so successful that the sponsoring divisions decided to schedule it on a regular basis every four years. Thus, the second symposium on 'The Physics and Chemistry of Si02 and the Si02 Interface was held May 18-21, 1992 in St. Louis, Missouri, again sponsored by the Electronics and Dielectrics Science and Technology Divisions of The Electrochemical Society. This volume contains manuscripts of most of the fifty nine papers presented at the 1992 symposium, and is divided into eight chapters - approximating the organization of the symposium. Each chapter is preceded with an introduction by the session organizers. It is appropriate to provide a general assessment of the current status and understanding of the physics and chemistry of Si02 and the Si02 interface before proceeding with a brief overview of the individual chapters. Semiconductor devices have continued to scale down in both horizontal and vertical dimensions. This has resulted in thinner gate and field oxides as well as much closer spacing of individual device features. As a result, surface condition, native oxide composition, and cleaning and impurity effects now provide a much more significant contribution to the properties of oxides and their interfaces.
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EUR 225,03
Spedizione EUR 66,30
Spedito da Germania a U.S.A.Quantità: 1 disponibili
Aggiungi al carrelloBuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - The properties of Si02 and the Si-Si02 interface provide the key foundation onto which the majority of semiconductor device technology has been built Their study has consumed countless hours of many hundreds of investigators over the years, not only in the field of semiconductor devices but also in ceramics, materials science, metallurgy, geology, and mineralogy, to name a few. These groups seldom have contact with each other even though they often investigate quite similar aspects of the Si02 system. Desiring to facilitate an interaction between these groups we set out to organize a symposium on the Physics and Chemistry of Si()z and the Si-Si()z Interface under the auspices of The Electrochemical Society, which represents a number of the appropriate groups. This symposium was held at the 173rd Meeting of The Electrochemical Society in Atlanta, Georgia, May 15-20, 1988. These dates nearly coincided with the ten year anniversary of the 'International Topical Conference on the Physics of Si02 and its Interfaces' held at mM in 1978. We have modeled the present symposium after the 1978 conference as well as its follow on at North Carolina State in 1980. Of course, much progress has been made in that ten years and the symposium has given us the opportunity to take a multidisciplinary look at that progress.
-
The Physics and Chemistry of Sio2 and the Si-sio2 Interface 2
Da: Revaluation Books, Exeter, Regno Unito
Valutazione del venditore 5 su 5 stelle
EUR 307,63
Spedizione EUR 14,72
Spedito da Regno Unito a U.S.A.Quantità: 2 disponibili
Aggiungi al carrelloPaperback. Condizione: Brand New. reprint edition. 519 pages. 9.25x6.10x1.05 inches. In Stock.
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface
Da: Revaluation Books, Exeter, Regno Unito
Valutazione del venditore 5 su 5 stelle
EUR 308,41
Spedizione EUR 14,72
Spedito da Regno Unito a U.S.A.Quantità: 2 disponibili
Aggiungi al carrelloPaperback. Condizione: Brand New. 570 pages. 9.30x6.20x1.30 inches. In Stock.
