Lichtenberg allan j (21 risultati)

Condizione: Good. This is an ex-library book and may have the usual library/used-book markings inside.This book has hardback covers. In good all round condition. Please note the Image in this listing is a stock photo and may not match the covers of the actual item,700grams, ISBN:047153417X.

Hardcover. Condizione: Very Good. 3. It's a well-cared-for item that has seen limited use. The item may show minor signs of wear. All the text is legible, with all pages included. It may have slight markings and/or highlighting.

Condizione: New.

Condizione: As New. Unread book in perfect condition.

Condizione: New.

Condizione: As New. Unread book in perfect condition.

Condizione: New.

Hardback. Condizione: New. A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understandingA new chapter covering the recent development of processes involving high-pressure capacitive dischargesNew subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field. …

Condizione: New. 3rd edition NO-PA16APR2015-KAP.

Condizione: New. 2024. 3rd Edition. hardcover. . . . . .

Hardcover. Condizione: Very Good. Very Good. Used with some reading wear but is still in great reading condition. No markings in text.

Condizione: New. In English.

Condizione: New. 2024. 3rd Edition. hardcover. . . . . . Books ship from the US and Ireland.

Condizione: New. Brand new! Please provide a physical shipping address.

Condizione: New.

Condizione: New.

Condizione: As New. Unread book in perfect condition.

Hardback. Condizione: New. A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understandingA new chapter covering the recent development of processes involving high-pressure capacitive dischargesNew subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field. …

Condizione: As New. Unread book in perfect condition.

Condizione: New. BRAND NEW. book.

Hardcover. 331 p. Good condition. The pages are clean and without markings. Retired library copy with corresponding markings. Slight signs of storage and use. No dust jacket. Otherwise, a neat copy. Sprache: Englisch Gewicht in Gramm: 1000.