Isbn: 9780819458292 - optical imaging in projection microlithography (13 risultati)

Condizione: As New. Unread book in perfect condition.

Condizione: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective. Series: Tutorial Texts. Num Pages: 276 pages, Illustrations. BIC Classification: TJFC; TTB. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 253 x 181 x 18. Weight in Grams: 662. . 2005. illustrated edition. Paperback. . . . .…

Paperback. Condizione: New. illustrated Edition. Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.…

Condizione: New.

PAP. Condizione: New. New Book. Shipped from UK. Established seller since 2000.

Condizione: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective. Series: Tutorial Texts. Num Pages: 276 pages, Illustrations. BIC Classification: TJFC; TTB. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 253 x 181 x 18. Weight in Grams: 662. . 2005. illustrated edition. Paperback. . . . . Books ship from the US and Ireland.…

Condizione: New.

Paperback / softback. Condizione: New. New copy - Usually dispatched within 4 working days.

Condizione: As New. Unread book in perfect condition.

Condizione: New. In English.

Paperback. Condizione: Brand New. illustrated edition. 276 pages. 9.75x6.75x0.50 inches. In Stock.

Paperback. Condizione: New. illustrated Edition. Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.…

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