Isbn: 9781402051876 - design for manufacturability and yield for nano-scale cmos (26 risultati)

Condizione: good. Supports Goodwill of Silicon Valley job training programs. The cover and pages are in Good condition! Any other included accessories are also in Good condition showing use. Use can include some highlighting and writing, page and cover creases as well as other types visible wear.

Hardcover. Condizione: New. SHRINK-WRAPPED: US SELLER SHIPS FAST FROM USA.

Condizione: New. Brand New. Soft Cover International Edition. Different ISBN and Cover Image. Priced lower than the standard editions which is usually intended to make them more affordable for students abroad. The core content of the book is generally the same as the standard edition. The country selling restrictions may be printed on the book but is no problem for the self-use. This Item maybe shipped from US or any other country as we have multiple locations worldwide.…

Condizione: Good. : Este libro aborda el diseño para la fabricabilidad y el rendimiento de CMOS a nanoescala. Explora los desafíos y soluciones en el diseño de circuitos integrados a nanoescala, centrándose en la optimización para la fabricación y el rendimiento. Cubre temas como la variabilidad del proceso, la gestión de la energía y las técnicas de diseño para mejorar la fiabilidad y el rendimiento de los sistemas CMOS a nanoescala. EAN: 9781402051876 Tipo: Libros Categoría: Tecnología|Ciencias Título: Design for Manufacturability and Yield for Nano-Scale CMOS Autor: Charles Chiang| Jamil Kawa Editorial: Springer Idioma: eng Páginas: 253 Formato: tapa dura.…

Condizione: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.

Condizione: New. Brand New Original US Edition. Customer service! Satisfaction Guaranteed.

Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.

Condizione: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.

Condizione: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.

Condizione: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.

Condizione: New. Brand New Original US Edition. Customer service! Satisfaction Guaranteed.

Condizione: As New. Unread book in perfect condition.

Condizione: New. In English.

Condizione: New.

Condizione: New.

Condizione: As New. Unread book in perfect condition.

Hardcover. Condizione: New Books. Brand New! Fast Delivery This is an International Edition and ship within 24-48 hours. Deliver by FedEx and Dhl, & Aramex, UPS, & USPS and we do accept APO and PO BOX Addresses. Order can be delivered worldwide within 6-10 days and we do have flat rate for up to 2LB. Extra shipping charges will be requested if the Book weight is more than 5 LB. This Item May be shipped from India, United states & United Kingdom. Depending on your location and availability.…

Buch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design's manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.…

Hardcover. Condizione: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

Buch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development. 288 pp. Englisch.…

Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Addressing a new topic (DFM/DFY) critical at 90 nm and beyondNo book available today with comprehensive coverage of this topicBook covers all CAD/CAE aspects of a SOC design flowDr. Charles Chiang is R&ampD Director of the Advanced. …

Buch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Manufacturability and yield are no longer a fabrication, packaging, and test concerns. They are aspects that have to be designed in, and they are everybody's responsibility. Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, and through statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design's manufacturability and yield. A must read book for the serious designer.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 288 pp. Englisch.…