Lingua: Inglese
Editore: Materials Research Society, 2011
ISBN 10: 1605113123 ISBN 13: 9781605113128
Da: Books Puddle, New York, NY, U.S.A.
Condizione: New. pp. ix + 127.
Lingua: Inglese
Editore: Materials Research Society, 2011
ISBN 10: 1605113123 ISBN 13: 9781605113128
Da: Majestic Books, Hounslow, Regno Unito
EUR 67,91
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Aggiungi al carrelloCondizione: New. pp. ix + 127 Illus.
Lingua: Inglese
Editore: Materials Research Society, 2011
ISBN 10: 1605113123 ISBN 13: 9781605113128
Da: Romtrade Corp., STERLING HEIGHTS, MI, U.S.A.
Condizione: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
Lingua: Inglese
Editore: Materials Research Society, 2011
ISBN 10: 1605113123 ISBN 13: 9781605113128
Da: Basi6 International, Irving, TX, U.S.A.
Condizione: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
Lingua: Inglese
Editore: Materials Research Society, 2011
ISBN 10: 1605113123 ISBN 13: 9781605113128
Da: Biblios, Frankfurt am main, HESSE, Germania
EUR 69,19
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Aggiungi al carrelloCondizione: New. pp. ix + 127.
Lingua: Inglese
Editore: Materials Research Society, 2011
ISBN 10: 1605113123 ISBN 13: 9781605113128
Da: Mispah books, Redhill, SURRE, Regno Unito
EUR 113,30
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Aggiungi al carrelloHardcover. Condizione: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.
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Condizione: As New. Unread book in perfect condition.
Lingua: Inglese
Editore: John Wiley & Sons Inc, New York, 2012
ISBN 10: 0470662549 ISBN 13: 9780470662540
Da: Grand Eagle Retail, Bensenville, IL, U.S.A.
Prima edizione
Hardcover. Condizione: new. Hardcover. Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirementsLow-k materials: fundamentals, advances and mechanical propertiesConductive layers and barriersIntegration and reliability including mechanical reliability, electromigration and electrical breakdownNew approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects. Shipping may be from multiple locations in the US or from the UK, depending on stock availability.
EUR 235,78
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Da: Brook Bookstore On Demand, Napoli, NA, Italia
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Aggiungi al carrelloCondizione: New. Brand new! Please provide a physical shipping address.
Da: Kennys Bookshop and Art Galleries Ltd., Galway, GY, Irlanda
EUR 252,27
Quantità: 15 disponibili
Aggiungi al carrelloCondizione: New. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects. Editor(s): Baklanov, Mikhail R.; Ho, Paul S.; Zschech, Ehrenfried. Num Pages: 606 pages, Illustrations. BIC Classification: TJFD. Category: (P) Professional & Vocational. Dimension: 248 x 171 x 32. Weight in Grams: 1058. . 2012. . . . .
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Aggiungi al carrelloGebunden. Condizione: New. Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over.
Lingua: Inglese
Editore: John Wiley & Sons Inc, New York, 2012
ISBN 10: 0470662549 ISBN 13: 9780470662540
Da: CitiRetail, Stevenage, Regno Unito
Prima edizione
EUR 252,22
Quantità: 1 disponibili
Aggiungi al carrelloHardcover. Condizione: new. Hardcover. Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirementsLow-k materials: fundamentals, advances and mechanical propertiesConductive layers and barriersIntegration and reliability including mechanical reliability, electromigration and electrical breakdownNew approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects. Shipping may be from our UK warehouse or from our Australian or US warehouses, depending on stock availability.
Da: Majestic Books, Hounslow, Regno Unito
EUR 313,07
Quantità: 3 disponibili
Aggiungi al carrelloCondizione: New. pp. 508 Illus.
Condizione: New. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects. Editor(s): Baklanov, Mikhail R.; Ho, Paul S.; Zschech, Ehrenfried. Num Pages: 606 pages, Illustrations. BIC Classification: TJFD. Category: (P) Professional & Vocational. Dimension: 248 x 171 x 32. Weight in Grams: 1058. . 2012. . . . . Books ship from the US and Ireland.
EUR 263,76
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Aggiungi al carrelloGebunden. Condizione: New. Karen Maex, IMEC Fellow, Silicon Process and Device Technology Division, Leuven, Belgium & Professor at Katholieke Universiteit LeuvenMikhail R. Baklanov, Principal Scientist, Silicon Process and Device Technology Division, IMEC, Leuven, BelgiumIMEC is the .
Da: Kennys Bookshop and Art Galleries Ltd., Galway, GY, Irlanda
Prima edizione
EUR 305,58
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Aggiungi al carrelloCondizione: New. The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Editor(s): Baklanov, Mikhail R.; Maex, Karen; Green, Martin. Series: Wiley Series in Materials for Electronic & Optoelectronic Applications. Num Pages: 508 pages, Illustrations. BIC Classification: TJF. Category: (P) Professional & Vocational. Dimension: 249 x 177 x 34. Weight in Grams: 1102. . 2007. 1st Edition. Hardcover. . . . .
Condizione: New. pp. 508.